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Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components. This work presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the First International Workshop on Laser Cleaning, held in Singapore in 2001.