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Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt

Language EnglishEnglish
Book Paperback
Book Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt Stanley D Crozier
Libristo code: 08143237
Publishers Biblioscholar, October 2012
The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characte... Full description
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The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characterize as potential metamaterials. This is achievable by developing a fabrication recipe to include exposure methods, exposure dosages, and material development. This study developed an interference lithography capability at AFIT for the first time with period resolution below 230nm. It also identified initial acceptable photoresist materials and exposure dosages, and a path to follow to optimize this process.

About the book

Full name Development of Interference Lithography Capability Using a Helium Cadmium Ultraviolet Multimode Laser for the Fabrication of Sub-Micron-Structured Opt
Author Stanley D Crozier
Language English
Binding Book - Paperback
Date of issue 2012
Number of pages 96
EAN 9781249829553
ISBN 9781249829553
Libristo code 08143237
Publishers Biblioscholar
Weight 186
Dimensions 189 x 246 x 5

Categories

Society & Social Sciences > Education
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